The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter

Droplet deposition has been a serious problem for film preparation by pulsed laser deposition. In this study, for metallic Fe and semiconducting Si targets, whose droplet ejections are remarkable, the droplets could be eliminated using a vane-type velocity filter. The velocity distribution for the droplets sizes was investigated. It was found that the velocity distribution of the Fe droplet had two peaks, while on the other hand, that of Si had only faster peak. The slower one is less than 10m/s and the faster one ranges between 20 and 50m/s. The droplet velocity is not significantly dependent on their size and the maximum is at most 50m/s.