Self-organized near-field etching of the sidewalls of glass corrugations

T. Yatsui; K. Hirata; Y. Tabata; Y. Miyake; Y. Akita; M. Yoshimoto; W. Nomura; T. Kawazoe; M. Naruse; M. Ohtsu

doi:10.1007/s00340-011-4569-1

Self-organized near-field etching of the sidewalls of glass corrugations

T. Yatsui
, K. Hirata
, Y. Tabata
, Y. Miyake
, Y. Akita
, M. Yoshimoto
, W. Nomura
, T. Kawazoe
, M. Naruse
, M. Ohtsu

研究成果: ジャーナルへの寄稿 › 学術誌 › 査読

13 被引用数 (Scopus)

抄録

Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

本文言語	英語
ページ（範囲）	527-530
ページ数	4
ジャーナル	Applied Physics B: Lasers and Optics
巻	103
号	3
DOI	https://doi.org/10.1007/s00340-011-4569-1
出版ステータス	出版済み - 6月 2011
外部発表	はい

!!!All Science Journal Classification (ASJC) codes

物理学および天文学（その他）
物理学および天文学一般

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10.1007/s00340-011-4569-1

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abstract = "Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.",

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AU - Yatsui, T.

AU - Hirata, K.

AU - Tabata, Y.

AU - Miyake, Y.

AU - Akita, Y.

AU - Yoshimoto, M.

AU - Nomura, W.

AU - Kawazoe, T.

AU - Naruse, M.

AU - Ohtsu, M.

PY - 2011/6

Y1 - 2011/6

N2 - Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

AB - Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

UR - https://www.scopus.com/pages/publications/79959493184

UR - https://www.scopus.com/pages/publications/79959493184#tab=citedBy

U2 - 10.1007/s00340-011-4569-1

DO - 10.1007/s00340-011-4569-1

M3 - Article

AN - SCOPUS:79959493184

SN - 0946-2171

VL - 103

SP - 527

EP - 530

JO - Applied Physics B: Lasers and Optics

JF - Applied Physics B: Lasers and Optics

IS - 3

ER -

Self-organized near-field etching of the sidewalls of glass corrugations

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!!!All Science Journal Classification (ASJC) codes

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