抄録
Hydrogen atoms chemisorbed in anodized porous silicon (PS) during anodization in a HF solution have been investigated by using both experimental techniques and a semi-empirical calculation method. The results show important roles of chemisorbed H atoms in PS on anodization mechanisms and a slight expansion of Si-Si bond length, as in the case of the structural change and low-temperature oxidation process of PS films previously reported. Fine structures observed in the infrared absorption band of the Si-H stretching vibrations can be related to charge redistributions of H-chemisorbed Si atoms which were calculated for various clusters with SinHm using the AM1 method. The calculation results on the Si-Si bond length in the clusters are also consistently explained in relation to slight increases in the lattice constant of PS: the origin comes from Si charges attracted by chemisorbed H atoms on the pore walls.
本文言語 | 英語 |
---|---|
ページ(範囲) | 535-539 |
ページ数 | 5 |
ジャーナル | Physica B: Physics of Condensed Matter |
巻 | 170 |
号 | 1-4 |
DOI | |
出版ステータス | 出版済み - 4月 1991 |
外部発表 | はい |
!!!All Science Journal Classification (ASJC) codes
- 電子材料、光学材料、および磁性材料
- 凝縮系物理学
- 電子工学および電気工学