Role of hydrogen atoms in anodized porous silicon

T. Ito, H. Kiyama, T. Yasumatsu, H. Watabe, A. Hiraki

研究成果: ジャーナルへの寄稿学術誌査読

26 被引用数 (Scopus)

抄録

Hydrogen atoms chemisorbed in anodized porous silicon (PS) during anodization in a HF solution have been investigated by using both experimental techniques and a semi-empirical calculation method. The results show important roles of chemisorbed H atoms in PS on anodization mechanisms and a slight expansion of Si-Si bond length, as in the case of the structural change and low-temperature oxidation process of PS films previously reported. Fine structures observed in the infrared absorption band of the Si-H stretching vibrations can be related to charge redistributions of H-chemisorbed Si atoms which were calculated for various clusters with SinHm using the AM1 method. The calculation results on the Si-Si bond length in the clusters are also consistently explained in relation to slight increases in the lattice constant of PS: the origin comes from Si charges attracted by chemisorbed H atoms on the pore walls.

本文言語英語
ページ(範囲)535-539
ページ数5
ジャーナルPhysica B: Physics of Condensed Matter
170
1-4
DOI
出版ステータス出版済み - 4月 1991
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 電子工学および電気工学

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