抄録
Thermal plasma reduction of a SiO2-Al2O3 mixture for metal production was investigated. The understanding of the reaction mechanism would be applied to metal recovery from coal ash. Thermal equilibrium and free energy of formation of the reaction systems were estimated to predict the evaporated species and to evaluate the predominant reactions. Atomic hydrogen plays an important role in the reduction of the SiO2-Al2O3 mixture. Argon and argon-hydrogen plasma jets were used for the treatment of the SiO2-Al2O3 mixture with various compositions. The argon plasma produces gaseous silicon and SiO from the SiO2-Al2O3 mixture, though the recovered amount was very little, while Al2O3 has not been reduced. The argon-hydrogen plasma produces mainly gaseous silicon with some additions of gaseous SiO and aluminum. Both of the argon and the argon-hydrogen plasmas produce the silicon component collected as the fumes having the purity of 98-99% from the SiO2-Al2O3 mixture.
本文言語 | 英語 |
---|---|
ページ(範囲) | 161-166 |
ページ数 | 6 |
ジャーナル | Thin Solid Films |
巻 | 345 |
号 | 1 |
DOI | |
出版ステータス | 出版済み - 5月 7 1999 |
外部発表 | はい |
イベント | Proceedings of the 1998 11th Symposium on Plasma Science for Materials (SPSM-11) / 4th Asia-Pacific Conference on Plasma Science and Technology (APCPST-4) - Sydney, NSW, Aust 継続期間: 7月 27 1998 → 7月 29 1998 |
!!!All Science Journal Classification (ASJC) codes
- 電子材料、光学材料、および磁性材料
- 表面および界面
- 表面、皮膜および薄膜
- 金属および合金
- 材料化学