Precipitate resolution in an electron irradiated ni-si alloy

H. Watanabe, T. Muroga, N. Yoshida, K. Kitajima

研究成果: ジャーナルへの寄稿学術誌査読

4 被引用数 (Scopus)

抄録

Precipitate resolution processes in a Ni-12.6 at% Si alloy under electron irradiation have been observed by means of HVEM. Above 400°C, growth and resolution of Ni3Si precipitates were observed simultaneously. The detail stereoscopic observation showed that the precipitates close to free surfaces grew, while those in the middle of a specimen dissolved. The critical dose when the precipitates start to shrink increases with increasing the depth. This depth dependence of the precipitate behavior under irradiation has a close relation with the formation of surface precipitates and the growth of solute depleted zone beneath them. The temperature and dose dependence of the resolution rate showed that the precipitates in the solute depleted zone dissolved by the interface controlled process of radiation-enhanced diffusion.

本文言語英語
ページ(範囲)179-187
ページ数9
ジャーナルJournal of Nuclear Materials
158
C
DOI
出版ステータス出版済み - 1988

!!!All Science Journal Classification (ASJC) codes

  • 核物理学および高エネルギー物理学
  • 材料科学一般
  • 原子力エネルギーおよび原子力工学

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