TY - JOUR
T1 - Organic-Inorganic Field Effect Transistor with SnI-based Perovskite Channel Layer using Vapor Phase Deposition Technique
AU - Matsushima, Toshinori
AU - Yasuda, Takeshi
AU - Fujita, Katsuhiko
AU - Tsutsui, Tetsuo
PY - 2003
Y1 - 2003
N2 - High field-effect hole mobility of 0.28 cm2/V.s (on/off ratio is more than 105, and threshold voltage is -3.2 V) in organic-inorganic layered perovskite film (C6H5C2H 4NH3)2SnI4 prepared by a vapor phase deposition technique have been demonstrated through the octadecyltrichlorosilane treatment of substrate. Previously, the (C 6H5C2H4NH3) 2PbI4 films prepared on the octadecyltrichlorosilane- covered substrates using a vapor evaporation showed not only intense exciton absorption and photoluminescence in the optical spectroscopy but also excellent crystallinity and large grain structure in X-ray and atomic force microscopic studies. Especially, the (C6H5C2H 4NH3)2PbI4 structure in the region below few nm closed to the surface of octadecyltrichlorosilane monolayer was drastically improved in comparison with that on the non-covered substrate. Though our initial (C6H5C2H4NH 3)2SnI4 films via a same sequence of preparation of (C6H5C2H4NH 3)2PbI4 and octadecyltrichlorosilane monolayer did not show the field-effect properties because of a lack of spectral, structural, and morphological features. The unformation of favorable (C 6H5C2H4NH3) 2SnI4 structure in the very thin region, that is very important for the field-effect transistors to transport electrons or holes, closed to the surface of non-covered SiO2 dielectric layer was also one of the problems for no observation of them. By adding further optimization and development, such as deposition rate of perovskite, substrate heating during deposition, and tuning device architecture, with hydrophobic treatment, the vacuum-deposited (C6H5C2H4NH 3)2SnI4 have achieved above-described high performance in organic-inorganic hybrid transistors.
AB - High field-effect hole mobility of 0.28 cm2/V.s (on/off ratio is more than 105, and threshold voltage is -3.2 V) in organic-inorganic layered perovskite film (C6H5C2H 4NH3)2SnI4 prepared by a vapor phase deposition technique have been demonstrated through the octadecyltrichlorosilane treatment of substrate. Previously, the (C 6H5C2H4NH3) 2PbI4 films prepared on the octadecyltrichlorosilane- covered substrates using a vapor evaporation showed not only intense exciton absorption and photoluminescence in the optical spectroscopy but also excellent crystallinity and large grain structure in X-ray and atomic force microscopic studies. Especially, the (C6H5C2H 4NH3)2PbI4 structure in the region below few nm closed to the surface of octadecyltrichlorosilane monolayer was drastically improved in comparison with that on the non-covered substrate. Though our initial (C6H5C2H4NH 3)2SnI4 films via a same sequence of preparation of (C6H5C2H4NH 3)2PbI4 and octadecyltrichlorosilane monolayer did not show the field-effect properties because of a lack of spectral, structural, and morphological features. The unformation of favorable (C 6H5C2H4NH3) 2SnI4 structure in the very thin region, that is very important for the field-effect transistors to transport electrons or holes, closed to the surface of non-covered SiO2 dielectric layer was also one of the problems for no observation of them. By adding further optimization and development, such as deposition rate of perovskite, substrate heating during deposition, and tuning device architecture, with hydrophobic treatment, the vacuum-deposited (C6H5C2H4NH 3)2SnI4 have achieved above-described high performance in organic-inorganic hybrid transistors.
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U2 - 10.1117/12.505509
DO - 10.1117/12.505509
M3 - Conference article
AN - SCOPUS:2342447932
SN - 0277-786X
VL - 5217
SP - 43
EP - 54
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
T2 - Organic Field Effect Transistors II
Y2 - 3 August 2003 through 4 August 2003
ER -