@inbook{2aaa3c1ea0814d45b81c2b619f9e15b9,
title = "Nucleation thin film processing",
abstract = "In this study, the stability of a very thin film at the initial stage of deposition was investigated using perturbation theory. It is assumed that the critical wave length of perturbation on a continuous thin film corresponds to the nuclei diameter and we also propose that the surface tension of a thin film changes with the film thickness. With these assumptions, it can be shown that the nucleus diameter grows linearly with deposition time. It is interesting to note that the resulting equation is similar to the well-known contact angle equation. To confirm the result of the analysis, a vacuum deposition experiment was conducted. Copper nuclei on the substrate were observed using a transmission electron microscope(TEM) and diameters of island nuclei were measured. The results clearly show that the effective nuclei diameter grows linearly with deposition time. The good agreement between analysis and the experiment suggests the validity of this analysis.",
author = "K. Hijikata and K. Miyazaki and T. Inoue and O. Nakabeppu",
year = "1996",
language = "English",
series = "American Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD",
pages = "137--142",
editor = "A.S. Lavine and U. Chandra and M.M. Chen and C.T. Crowe and U. Fritsching and \{et al\}, al",
booktitle = "Transport Phenomena in Materials Processing and Manufacturing",
note = "Proceedings of the 1996 ASME International Mechanical Engineering Congress and Exposition ; Conference date: 17-11-1996 Through 22-11-1996",
}