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NUCLEATION IN THIN FILM PROCESSING

研究成果: 書籍/レポート タイプへの寄稿会議への寄与

抄録

In this study, the stability of a very thin film at the initial stage of deposition was investigated using perturbation theory. It is assumed that the critical wave length of perturbation on a continuous thin film corresponds to the nuclei diameter and we also propose that the surface tension of a thin film changes with the film thickness. With these assumptions, it can be shown that the nucleus diameter grows linearly with deposition time. It is interesting to note that the resulting equation is similar to the well-known contact angle equation. To confirm the result of the analysis, a vacuum deposition experiment was conducted. Copper nuclei on the substrate were observed using a transmission electron microscope(TEM) and diameters of island nuclei were measured. The results clearly show that the effective nuclei diameter grows linearly with deposition time. The good agreement between analysis and the experiment suggests the validity of this analysis.

本文言語英語
ホスト出版物のタイトルTransport Phenomena in Materials Processing and Manufacturing
出版社American Society of Mechanical Engineers (ASME)
ページ137-142
ページ数6
ISBN(電子版)9780791815243
DOI
出版ステータス出版済み - 1996
外部発表はい
イベントASME 1996 International Mechanical Engineering Congress and Exposition, IMECE 1996 - Atlanta, 米国
継続期間: 11月 17 199611月 22 1996

出版物シリーズ

名前ASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE)
1996-AG

会議

会議ASME 1996 International Mechanical Engineering Congress and Exposition, IMECE 1996
国/地域米国
CityAtlanta
Period11/17/9611/22/96

!!!All Science Journal Classification (ASJC) codes

  • 機械工学

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