New type TFT with unique operation and simple fabrication process

A thin film transistor (TFT) with a new structure and a unique operation principle has been proposed. This TFT has Schottky barrier contacts at source and drain, and employs electron tunneling through the Schottky barrier. The first feature of this TFT is simplification of the production process because a self-aligned technique is applicable and an ion-implantation process is not necessary. These advantages are promising for low-cost production of active-matrix liquid crystal displays (AM-LCDs). In this letter, we propose of new type TFT and carry out 2-D device simulation on a simplified structure to show the fundamental characteristics of this transistor and to optimize impurity density, channel thickness, and barrier height.