Molecular dynamics study of velocity distribution and local temperature change during rapid cooling processes in excimer-laser annealed silicon

Byoung Min Lee, Shinji Munetoh, Teruaki Motooka

    研究成果: ジャーナルへの寄稿学術誌査読

    16 被引用数 (Scopus)

    抄録

    Molecular dynamics (MD) simulations have been performed to investigate velocity distribution of atoms and local temperature changes during rapid cooling processes in excimer-laser annealed Si. The interatomic forces were calculated using the Tersoff potential, and the rapid cooling processes were simulated by determining the atomic movements with a combination of Langevin and Newton equations using a MD cell with the size of 48.9 × 48.9 × 97.8 Å3. The local velocity distribution during rapid cooling processes was found to be the Maxwell-Boltzmann type, and the steady-state temperature distribution was obtained within 100 ps.

    本文言語英語
    ページ(範囲)198-202
    ページ数5
    ジャーナルComputational Materials Science
    37
    3
    DOI
    出版ステータス出版済み - 9月 2006

    !!!All Science Journal Classification (ASJC) codes

    • コンピュータサイエンス一般
    • 化学一般
    • 材料科学一般
    • 材料力学
    • 物理学および天文学一般
    • 計算数学

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