Microstructure and strain distribution in freestanding Si membrane strained by SixNy deposition
Hongye Gao, Ken Ichi Ikeda, Satoshi Hata, Hideharu Nakashima, Dong Wang, Hiroshi Nakashima
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
1
被引用数
(Scopus)