Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

研究成果: ジャーナルへの寄稿学術誌査読

3 被引用数 (Scopus)

抄録

Carbon nanoparticles (CNPs) incorporated diamond-like carbon (DLC) films have been fabricated by a combination of rf sputtering and plasma chemical vapor deposition. Spherical CNPs with a mean size of 21.2 nm are sandwiched between DLC layers with a mass density of 1.7 g cm-3. The film stress is decreased to 119 MPa, by depositing the CNPs over the base DLC layer at a surface coverage of 10.7%. This reduction is approximately half of that without CNPs. Raman spectroscopy indicates the insertion of CNPs barely alters the bonding structure of the upper DLC layer.

本文言語英語
論文番号100906
ジャーナルJapanese journal of applied physics
59
10
DOI
出版ステータス出版済み - 10月 2020

!!!All Science Journal Classification (ASJC) codes

  • 工学一般
  • 物理学および天文学一般

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