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In-situ electron microscopy of cu movement in MoOx/Al2O3 bilayer CBRAM during cyclic switching

  • R. Ishikawa
  • , S. Hirata
  • , A. Tsurumaki-Fukuchi
  • , M. Arita
  • , Y. Takahashi
  • , M. Kudo
  • , S. Matsumura

研究成果: 書籍/レポート タイプへの寄稿会議への寄与

抄録

In-situ TEM (transmission electron microscopy) was applied to Cu/MoOx/Al2O3 bilayer CBRAM and the change of the Cu microstructure were observed during cyclic Set/Reset switching. In the Set process giving the low resistance state (LRS), a dark contrast appeared in Al2O3 layer, and in the Reset process giving the high resistance state (HRS), it almost disappeared. This result means that the resistance changed by formation and rupture of the conducting filament. In our MoOx/Al2O3 CBRAMs, cyclic Set/Reset operations were achieved with the real-time TEM observations. During the cycles, device degradation, i.e., gradual decrease in the resistance in the cyclic operation was observed in the both HRS and LRS. We confirmed that the contrast of the Cu layer and the Al2O3 layer had changed while the device degraded.

本文言語英語
ホスト出版物のタイトルECS Transactions
編集者A. P. Abbott, R. Alkire, P. Allongue, T. J. Anderson, P. N. Bartlett, M. Bayachou, S. Bhansali, N. Birbilis, A. B. Bocarsly, C. Bock, O. V. Boltalina, S. Brankovic, R. Buchheit, D. A. Buttry, S. Calabrese Barton, M. T. Carter, V. Chaitanya, G. T. Cheek, Z. Chen, D. Chidambaram, B. A. Chin, J. W. Choi, D. Chu, D. E. Cliffel, H. Deligianni, V. Di Noto, N. Dimitrov, M. Doeff, E. A. Douglas, T. Druffel, K. Edstrom, J. M. Fenton, J. Fergus, J. Fransaer, Y. Fukunaka, D. Guyomard, H. Hamada, L. M. Haverhals, P. Hesketh, A. C. Hillier, J. K. Hite, H. Imahori, M. Inaba, M. Innocenti, M. Itagaki, C. Johnson, H. Katayama, S. H. Kilgore, D. J. Kim, J. Koehne, R. Kostecki, G. Krumdick, P. J. Kulesza, J. Leddy, J. J. Lee, O. Leonte, Y. C. Lu, B. L. Lucht, R. P. Lynch, M. Manivannan, R. A. Mantz, P. Marcus, V. Maurice, M. Mauter, J. Mauzeroll, H. N. McMurray, Y. S. Meng, E. L. Miller, I. Milosev, S. D. Minteer, S. Mitra, S. Mukerjee, R. Mukundan, J. Muldoon, L. Nagahara, S. R. Narayan, P. M. Natishan, M. Navaei, J. D. Nicholas, J. Noel, S. S. Nonnenmann, C. O'Dwyer, M. E. Orazem, Y. Oren, J. G. Park, P. Pharkya, P. N. Pintauro, S. Pylypenko, K. Rajeshwar, R. P. Ramasamy, C. Rhodes, D. P. Riemer, D. Roeper, M. Rohwerder, L. Romankiw, S. V. Rotkin, J. L. M. Rupp, M. J. Sailor, D. T. Schwartz, P. K. Sekhar, N. Sharma, A. Simonian, D. K. Smith, K. C. Smith, L. Soleymani, G. R. Stafford, J. A. Staser, V. Subramanian, V. R. Subramanian, K. B. Sundaram, A. H. Suroviec, K. Suto, M. Tao, T. Tatsuma, P. C. Trulove, P. Vanysek, N. Vasiljevic, J. T. Vaughey, S. Virtanen, H. Wang, W. Wang, J. F. Whitacre, G. Williams, M. Winter, D. L. Wood, G. Wu, N. Wu, J. Xiao, Y. Xing, H. Xu, J. J. Yang, G. Zangari
出版社Electrochemical Society Inc.
ページ903-910
ページ数8
10
ISBN(電子版)9781607688273
ISBN(印刷版)9781623324797
DOI
出版ステータス出版済み - 2017
イベント232nd ECS Meeting - National Harbor, 米国
継続期間: 10月 1 201710月 5 2017

出版物シリーズ

名前ECS Transactions
番号10
80
ISSN(印刷版)1938-6737
ISSN(電子版)1938-5862

その他

その他232nd ECS Meeting
国/地域米国
CityNational Harbor
Period10/1/1710/5/17

!!!All Science Journal Classification (ASJC) codes

  • 工学一般

フィンガープリント

「In-situ electron microscopy of cu movement in MoOx/Al2O3 bilayer CBRAM during cyclic switching」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

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