Improvement of catalyst durability in benzene photooxidation by rhodium deposition on TiO2

Hisahiro Einaga; Shigeru Futamura; Takashi Ibusuki

doi:10.1246/cl.2001.582

Improvement of catalyst durability in benzene photooxidation by rhodium deposition on TiO₂

Hisahiro Einaga, Shigeru Futamura, Takashi Ibusuki

研究成果: ジャーナルへの寄稿 › 学術誌 › 査読

17 被引用数 (Scopus)

抄録

Photocatalytic oxidation of benzene in air was carried out over TiO₂ and metal-loaded TiO₂ catalysts at room temperature. Deposition of Rh on TiO₂ improved the catalyst durability by inhibiting the formation of carbon deposits on the catalyst surface and accelerating their decomposition.

本文言語	英語
ページ（範囲）	582-583
ページ数	2
ジャーナル	Chemistry Letters
号	6
DOI	https://doi.org/10.1246/cl.2001.582
出版ステータス	出版済み - 2001
外部発表	はい

!!!All Science Journal Classification (ASJC) codes

化学 (全般)

文献へのアクセス

10.1246/cl.2001.582

他のファイルとリンク

引用スタイル

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title = "Improvement of catalyst durability in benzene photooxidation by rhodium deposition on TiO2",

abstract = "Photocatalytic oxidation of benzene in air was carried out over TiO2 and metal-loaded TiO2 catalysts at room temperature. Deposition of Rh on TiO2 improved the catalyst durability by inhibiting the formation of carbon deposits on the catalyst surface and accelerating their decomposition.",

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year = "2001",

doi = "10.1246/cl.2001.582",

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journal = "Chemistry Letters",

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AU - Futamura, Shigeru

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