Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition
Susumu Toko, Yoshihiro Torigoe, Kimitaka Keya, Takashi Kojima, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
6
被引用数
(Scopus)