High-Density plasma production in the Gamma 10 central cell with ICRF heating on both anchor cells

S. Sumida, M. Ichimura, T. Yokoyama, M. Hirata, R. Ikezoe, Y. Iwamoto, T. Okada, K. Takeyama, S. Jang, M. Sakamoto, Y. Nakashima, M. Yoshikawa, R. Minami, K. Oki, M. Mizuguchi, K. Ichimura

研究成果: ジャーナルへの寄稿学術誌査読

11 被引用数 (Scopus)


In the GAMMA 10 tandem mirror, divertor simulation experiments that utilize particle flux toward the west end region (called end-loss flux) have been implemented. Since a positive correlation has been reported between the end-loss flux and the central-cell density, an increase of the central-cell density is important for obtaining a higher end-loss flux on the divertor simulation experiments. By arranging the ion cyclotron range of frequency (ICRF) systems so as to excite strong ICRF waves in both anchor cells simultaneously, we have succeeded in producing high-density plasmas (line density of 1.2 × 1014 cm-2) in both anchor cells. As a result, a higher central-cell density of 4.4 × 1012 cm-3and a higher end-loss flux of more than 1023 m-2s-1have been obtained. One of the possible mechanisms of the high density production is a formation of positive potentials on both anchor cells. Plasmas in the central cell are confined due to those potentials.

ジャーナルFusion Science and Technology
出版ステータス出版済み - 7月 1 2015

!!!All Science Journal Classification (ASJC) codes

  • 土木構造工学
  • 核物理学および高エネルギー物理学
  • 原子力エネルギーおよび原子力工学
  • 材料科学一般
  • 機械工学


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