Fabrication of M3+-substituted and M3+/V 5+-cosubstituted bismuth titanate thin films [M = lanthanoid] by chemical solution deposition technique

Hiroshi Uchida, Hiroki Yoshikawa, Isao Okada, Hirofumi Matsuda, Takashi Iljima, Takayuki Watanabe, Hiroshi Funakubo

研究成果: ジャーナルへの寄稿学術誌査読

69 被引用数 (Scopus)

抄録

Lanthanoid (M3+ = La3+, Pr3+", Nd3+ and Sm3+)-consubstituted and lanthanoid/vanadium (V5+)-cosubstituted bismuth titanate thin films were fabricated on (111)Pt/Ti/SiO2/(100)Si substrates by a chemical solution deposition (CSD) technique. All the films consisted of a polycrystalline structure with random crystal orientation. Pe3+, Nd3+ and Sm 3+-substituted BIT films [BPT, BNT and BST] had larger remanent polarization (Pr) values than that of conventional La3+-substituted BIT film [BLT]; furthermore, the Pr value of the BNT film was higher than those of the BPT and BST films. On the other hand, no significant difference in the coercive field (Ec) value was found among those films. Pr and Ec values of the BNT film with y = 0.50 in (Bi4.00-y, Ndy.)Ti3.00O12 were measured to be 32 μC/cm2 and 126kV/cm, respectively. V 5+-substitution varied the Pr value of the lanthanoid-substituted BIT films without changing the in Ec value. The Pr value of the BNT film with y = 0.50 was improved up to 37 μC/cm 2 by V5+-substitution of x = 0.02 in (Bi4.00-y, Ndy) 1-(x/12) (Ti3.00-x, Vx)O 12 [BNTV]. Ferroelectric properties of the Pb-free polycrystalline BNT and BNTV films are comparable to those of conventional Pb-based ferroelectric films such as lead zirconate titanate [PZT] films.

本文言語英語
ページ(範囲)6820-6824
ページ数5
ジャーナルJapanese Journal of Applied Physics
41
11 B
DOI
出版ステータス出版済み - 11月 2002
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 工学一般
  • 物理学および天文学一般

フィンガープリント

「Fabrication of M3+-substituted and M3+/V 5+-cosubstituted bismuth titanate thin films [M = lanthanoid] by chemical solution deposition technique」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル