Fabrication of ferromagnetic Fe₃Si thin films by pulsed laser deposition using an Fe₃Si target

Physics

• Substrates 100%
• Thin Films 80%
• Pulsed Laser Deposition 40%
• Quartz 40%
• Temperature 20%
• High Temperature 20%
• Targets 20%
• Atoms 20%
• Diffusivity 20%
• Fabrication 20%
• Room Temperature 20%
• Polycrystalline 20%
• Electrical Resistivity 20%

Material Science

• Thin Films 80%
• Crystallite 40%
• Liquid Films 40%
• Giant Magnetoresistance 40%
• Amorphous Material 40%