@inproceedings{00762b486eb0445d842494023c0b22ad,
title = "Fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate",
abstract = "In this paper we study about the fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate.",
author = "Tsuyoshi Fujimura and Akihiro Ikeda and Etoh, {Shin Ichi} and Reiji Hattori and Yukinori Kuroki and Masanori Hidaka and Chang, {Suk Sang}",
note = "Publisher Copyright: {\textcopyright} 2003 Japan Soc. of Applied.; International Microprocesses and Nanotechnology Conference, MNC 2003 ; Conference date: 29-10-2003 Through 31-10-2003",
year = "2003",
doi = "10.1109/IMNC.2003.1268531",
language = "English",
series = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "86--87",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",
address = "United States",
}