Effects of gas flow rate on deposition rate and number of Si clusters incorporated into a-Si:H films
Susumu Toko, Yoshihiro Torigoe, Kimitaka Keya, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
7
被引用数
(Scopus)