Effect of surface pH on electrodeposited Ni films

M. Motoyama, Y. Fukunaka, T. Sakka, Y. H. Ogata

研究成果: ジャーナルへの寄稿学術誌査読

45 被引用数 (Scopus)

抄録

Ni metal was potentiostatically electrodeposited on a vertical plane cathode in a Watts bath in order to determine the effect of the cathode surface pH on the Ni film microstructure. Polarization curves and current efficiencies were measured at pH values of 1.5, 3.4, and 5.5. The surface pH value (pHs) was estimated from the measured partial current density for hydrogen gas evolution based on a steady-state one-dimensional mass transfer model. Any species relating to the buffering function through the dissociation reactions (HSO4-, H3 BO3, Ni4 (OH) 4 4+, H3 O+, OH-) were taken into account. The pHs abruptly rose to above 6 as the partial current density for H2 gas evolution increased. The preferred orientation of electrodeposited Ni thin film was plotted in electrode potential- pHs diagram. It was found that the transition boundary between {110} and {100} preferred orientations was located along a ridge 500 mV below the H+ H2 equilibrium potential line. This relationship suggests that the dissolved hydrogen atoms in Ni metal are partly responsible for the evolution of structural texture of the Ni films.

本文言語英語
ページ(範囲)C502-C508
ジャーナルJournal of the Electrochemical Society
153
7
DOI
出版ステータス出版済み - 7月 2006
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 再生可能エネルギー、持続可能性、環境
  • 表面、皮膜および薄膜
  • 電気化学
  • 材料化学

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