メインナビゲーションにスキップ 検索にスキップ メインコンテンツにスキップ

Disorder-induced multiple transition involving ℤ2 topological insulator

研究成果: ジャーナルへの寄稿学術誌査読

抄録

Effects of disorder on two-dimensional ℤ2 topological insulator are studied numerically by the transfer matrix method. Based on the scaling analysis, the phase diagram is derived for a model of HgTe quantum well as a function of disorder strength and magnitude of the energy gap. In the presence of sz non-conserving spin-orbit coupling, a finite metallic region is found that partitions the two topologically distinct insulating phases. As disorder increases, a narrow-gap topologically trivial insulator undergoes a series of transitions; first to metal, second to topological insulator, third to metal, and finally back to trivial insulator. We show that this multiple transition is a consequence of two disorder effects; renormalization of the band gap, and Anderson localization. The metallic region found in the scaling analysis corresponds roughly to the region of finite density of states at the Fermi level evaluated in the self-consistent Born approximation.

本文言語英語
論文番号053703
ジャーナルjournal of the physical society of japan
80
5
DOI
出版ステータス出版済み - 5月 2011
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 物理学および天文学一般

フィンガープリント

「Disorder-induced multiple transition involving ℤ2 topological insulator」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル