Development of visualization system of neutral particles generated from laser-produced Plasma for an EUV light source

Hiroki Tanaka, Atsushi Matsumoto, Akihiko Takahashi, Tatsuo Okada

研究成果: ジャーナルへの寄稿学術誌査読

1 被引用数 (Scopus)

抄録

In the development of extreme ultraviolet (EUV) sources for practical optical lithography systems, one of the most important subjects is debris mitigation. In, particularly mitigation of fast neutral atoms is very difficult compared with other particles such as ions and droplets. Thus, in our study, we developed a visualization system for neutral atoms emitted from laser-produced plasma (LPP) based EUV source using a laser induced fluorescence (LIF) method and investigated neutral debris behaviors in order to obtain the guideline for the optimization of debris shields. In the present measurement system, neutral atoms with a kinetic energy of less than 200 eV could be detected at a pump fluence of about 4 102 J/cm2 using a solid tin target. The interaction between the fast ions and substrate was also observed by the LIF system

本文言語英語
論文番号162
ページ(範囲)758-761
ページ数4
ジャーナルJournal of Physics: Conference Series
59
1
DOI
出版ステータス出版済み - 4月 1 2007

!!!All Science Journal Classification (ASJC) codes

  • 物理学および天文学一般

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