Development of a 915 MHz ECR plasma source

Yoshinobu Kawai; Kiichiro Uchino; Hiroshi Muta; Tobias Röwf

doi:10.1016/j.vacuum.2012.03.016

Development of a 915 MHz ECR plasma source

Yoshinobu Kawai
, Kiichiro Uchino
, Hiroshi Muta
, Tobias Röwf

電気理工学

研究成果: ジャーナルへの寄稿 › 学術誌 › 査読

6 被引用数 (Scopus)

抄録

We produced a 915 MHz ECR plasma with TM₀₁ microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

本文言語	英語
ページ（範囲）	123-127
ページ数	5
ジャーナル	Vacuum
巻	87
DOI	https://doi.org/10.1016/j.vacuum.2012.03.016
出版ステータス	出版済み - 2013

!!!All Science Journal Classification (ASJC) codes

器械工学
凝縮系物理学
表面、皮膜および薄膜

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10.1016/j.vacuum.2012.03.016

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引用スタイル

@article{c679f686b5c44108b64ac404212d23d7,

title = "Development of a 915 MHz ECR plasma source",

abstract = "We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.",

author = "Yoshinobu Kawai and Kiichiro Uchino and Hiroshi Muta and Tobias R{\"o}wf",

note = "Publisher Copyright: {\textcopyright} 2012 Elsevier Ltd.",

year = "2013",

doi = "10.1016/j.vacuum.2012.03.016",

language = "English",

volume = "87",

pages = "123--127",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Ltd",

}

TY - JOUR

T1 - Development of a 915 MHz ECR plasma source

AU - Kawai, Yoshinobu

AU - Uchino, Kiichiro

AU - Muta, Hiroshi

AU - Röwf, Tobias

PY - 2013

Y1 - 2013

N2 - We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

AB - We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

UR - https://www.scopus.com/pages/publications/84891736582

UR - https://www.scopus.com/pages/publications/84891736582#tab=citedBy

U2 - 10.1016/j.vacuum.2012.03.016

DO - 10.1016/j.vacuum.2012.03.016

M3 - Article

AN - SCOPUS:84891736582

SN - 0042-207X

VL - 87

SP - 123

EP - 127

JO - Vacuum

JF - Vacuum

ER -

Development of a 915 MHz ECR plasma source

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!!!All Science Journal Classification (ASJC) codes

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