Crystallographic orientation contrast associated with Ga+ ion channelling for Fe and Cu in focused ion beam method

Y. Yahiro, K. Kaneko, T. Fujita, W. J. Moon, Z. Horita

    研究成果: ジャーナルへの寄稿学術誌査読

    19 被引用数 (Scopus)

    抄録

    In this study, Cu and Fe single crystals are used to examine the change in secondary electron intensity associated with Ga+ ion channelling in a focused ion beam (FIB) system. The single crystals having three different orientations are tilted with respect to the beam incidence and the resulting variation in the secondary electron intensity is measured through the variation in brightness of the crystals. It is shown that intensity minima appear at the beam directions normal to the lower indices of the crystal orientations. The appearance of the intensity minima including the magnitude of the minima is consistent with the prediction based on the event of ion channelling in the crystal and is affected by the crystal structure. The effect of background on the intensity minima is discussed in this study. It is suggested that the presence of the intensity minima may be used to identify a crystal orientation including a crystal structure.

    本文言語英語
    ページ(範囲)571-576
    ページ数6
    ジャーナルJournal of Electron Microscopy
    53
    5
    DOI
    出版ステータス出版済み - 2004

    !!!All Science Journal Classification (ASJC) codes

    • 器械工学

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