Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si

Byoung Min Lee, Baek Seok Seong, Hak Rho Kim, Shinji Munetoh, Teruaki Motooka

    研究成果: 書籍/レポート タイプへの寄稿会議への寄与

    抄録

    To investigate the cooling mechanism and the local structural changes of excimer laser-annealed silicon (Si), molecular dynamics (MD) simulations were performed. Heat flow of molten Si showed a strong dependency of the local region during a natural cooling. An amorphous-to-liquid transition near an interface in the temperature range of 1600 K ∼ 1800 K was expected with the results of the local diffusion coefficients calculated by integrating the velocity autocorrelation functions. It was confirmed that the structure of the interface region affected the cooling rate of the overall system. The structural properties at the various local regions after a cooling were assessed in terms of the configurational properties including the coordination and bond-angle distributions. A spontaneous nucleation of Si near a interface was observed during a natural cooling.

    本文言語英語
    ホスト出版物のタイトルMultiscale Modeling of Materials
    出版社Materials Research Society
    ページ225-230
    ページ数6
    ISBN(印刷版)9781604234268
    DOI
    出版ステータス出版済み - 2006
    イベント2006 MRS Fall Meeting - Boston, MA, 米国
    継続期間: 11月 27 200612月 1 2006

    出版物シリーズ

    名前Materials Research Society Symposium Proceedings
    978
    ISSN(印刷版)0272-9172

    その他

    その他2006 MRS Fall Meeting
    国/地域米国
    CityBoston, MA
    Period11/27/0612/1/06

    !!!All Science Journal Classification (ASJC) codes

    • 材料科学(全般)
    • 凝縮系物理学
    • 材料力学
    • 機械工学

    フィンガープリント

    「Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル