Consideration of Growth Mechanism of Diamond Thin Films by Pulsed Laser Deposition

Takeshi Hara, Takasi Nishiyama, Tsuyoshi Yoshitake, Kunihito Nagayama

研究成果: ジャーナルへの寄稿学術誌査読

抄録

Although diamond thin films have been mainly produced by chemical vapor deposition methods (CVD) up to now, pulsed laser deposition (PLD) have a potential for growing diamond thin films including no hydrogen at a lower substrate temperature than those of CVD. In the previous study, we could succeed in growing diamond thin film homoepitaxially in an oxygen atmosphere by pulsed laser ablation of graphite. In this report, we investigated structural change of diamond thin film for the substrate temperature and the repetition rate of laser pulses. Based on the result, we considered the growth mechanism of diamond thin film by pulsed laser deposition.

本文言語英語
ページ(範囲)939-944
ページ数6
ジャーナルIEEJ Transactions on Fundamentals and Materials
123
9
DOI
出版ステータス出版済み - 2003

!!!All Science Journal Classification (ASJC) codes

  • 電子工学および電気工学

フィンガープリント

「Consideration of Growth Mechanism of Diamond Thin Films by Pulsed Laser Deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル