Computer simulation of nano-pore formation in EB-PVD thermal barrier coatings

M. Yoshiya, K. Wada, B. K. Jang, H. Matsubara

研究成果: ジャーナルへの寄稿学術誌査読

16 被引用数 (Scopus)

抄録

Two-dimensional Monte Carlo simulations have been conducted to investigate the mechanism of nano-pore formation during film deposition. The macroscopic structure obtained from the simulation is in good agreement with experiments. It is found that random accumulation of vapor phase particles creates pores that are inclined away from the incident direction at angles dependent on the ratio of the parallel and perpendicular accumulation rates. When the incident direction is inclined away from the surface normal, the pore orientation angle (POA) distribution exhibits a single peak rather than two peaks due to self-shadowing. Both the area and the orientation of the intracolumnar pores are analyzed. The results indicate that the pore configuration can be altered by changing the physical parameters of the deposition process.

本文言語英語
ページ(範囲)399-407
ページ数9
ジャーナルSurface and Coatings Technology
187
2-3
DOI
出版ステータス出版済み - 10月 22 2004
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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