Axial distribution of a VHF H2 plasma produced by a narrow gap discharge

Kuan Chen Chen, Chia Fu Chen, Cheng Yang Lien, Kuo Feng Chiu, Jen Bin Shi, Yu Jer Tsai, Ting Kuei Lien, Kohei Ogiwara, Kiichiro Uchino, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿学術誌査読

3 被引用数 (Scopus)


A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.

ジャーナルJapanese journal of applied physics
出版ステータス出版済み - 1月 2016

!!!All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)


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