Atomic layer deposition of self-assembled aluminum nanoparticles using dimethylethylamine alane as precursor and trimethylaluminum as an initiator

Sameh Okasha, Yuichi Harada

    研究成果: ジャーナルへの寄稿学術誌査読

    3 被引用数 (Scopus)

    抄録

    Our research provided a way to produce earth-abundant plasmonic nanoparticles with a well-defined orientation (111) for energy materials and nanosensing applications. In the atomic layer deposition (ALD) of aluminum nanoparticles, dimethylethylamine alane (DMEAA; AlH3N(CH3)2(CH2CH3)) has been employed as a processor of the aluminum source, while trimethylaluminum (TMA) as a growth initiator. We studied the morphology of self-assembled aluminum nanoparticle growth with the ALD process by passivating TMA on a silicon surface with previously absorbed hydroxyl groups. The reaction mechanism was proposed for the dissociation of the initiator (TMA), the precursor (DMEAA), and the effect of each one of them on the particle size by analyzing the obtained morphologies. Our results led us to theorize that to initiate the nucleation and the growth of aluminum nanoparticles, a conductive source of electrons is required such as TMA. We discussed the growth of aluminum nanoparticles as well as morphology step by step through SEM images. The observations showed that tetrahedrons of aluminum nanoparticles continue growing to octahedrons. The XRD analysis confirmed the orientation of aluminum nanoparticles in (111), in addition to obtaining their crystallinity information in-depth. This approach could allow for further development of new controlled morphologies and increase the knowledge in the growth of earth-abundant plasmonic nanoparticles.

    本文言語英語
    論文番号242
    ジャーナルJournal of Nanoparticle Research
    24
    12
    DOI
    出版ステータス出版済み - 12月 2022

    !!!All Science Journal Classification (ASJC) codes

    • バイオエンジニアリング
    • 原子分子物理学および光学
    • 化学一般
    • モデリングとシミュレーション
    • 材料科学一般
    • 凝縮系物理学

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