Atomic Layer Deposition for Thin Film Solid-State Battery and Capacitor

Dohyun Go, Jeong Woo Shin, Seunghyeon Lee, Jaehyeong Lee, Byung Chan Yang, Yoonjin Won, Munekazu Motoyama, Jihwan An

研究成果: ジャーナルへの寄稿総説査読

4 被引用数 (Scopus)

抄録

The demand for electrical power management has increased in recent years, owing partly to increasing contribution of intermittent renewable energy resources to the overall electricity generation. Electrical energy storage systems, such as batteries and capacitors, are core technologies for effective power management. Recent significant technological developments for these energy storage devices include the use of thin film components, which result in increased capacity and reliability. Specifically, thin films with high integrity and uniformity are required in the electrolytes of solid-state Li batteries (SSLBs) and the dielectrics of electrostatic capacitors (ECs), even at extremely thin length scale (< 100 nm) and on complex nanostructures. In this regard, atomic layer deposition (ALD), which can deposit uniform and dense thin films over 3-dimensional (3D) structures, has demonstrated its efficiency in increasing device performance, particularly when applied to the electrolytes and dielectrics of SSLBs and ECs. As a result, the applications of ALD techniques to SSLB electrolytes and EC dielectrics will be examined in this study, with a particular emphasis on research instances that used high aspect ratio structures with conformal ALD coating. Finally, we will discuss how recent advances in innovative ALD processes and equipment with better controllability, versatility, throughput, and economy may further contribute to the development of SSLBs and ECs, especially at scaled-up level.

本文言語英語
ページ(範囲)851-873
ページ数23
ジャーナルInternational Journal of Precision Engineering and Manufacturing - Green Technology
10
3
DOI
出版ステータス出版済み - 5月 2023
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 再生可能エネルギー、持続可能性、環境
  • 材料科学一般
  • 機械工学
  • 産業および生産工学
  • 技術マネージメントおよび技術革新管理

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