TY - JOUR
T1 - An efficient matrix that resists the nonspecific adsorption of protein to fabricate carbohydrate arrays on silicon
AU - Shirahata, Naoto
AU - Hozumi, Atsushi
AU - Miura, Yoshiko
AU - Kobayashi, Kazukiyo
AU - Sakka, Yoshio
AU - Yonezawa, Tetsu
N1 - Funding Information:
This study was partly performed through Special Coordination Funds for Promoting Science and Technology from the Ministry of Education, Culture, Sports, Science and Technology of the Japanese Government.
PY - 2006/3/21
Y1 - 2006/3/21
N2 - Efficient matrix that resists the nonspecific adsorption of proteins from the contacting phosphate buffer silane (PBS) solution has been explored to fabricate carbohydrate arrays on silicon wafer. p-Vinylbenzyllactonoamide (VLA) was immobilized onto silicon through Si-C bond. The VLA-covered substrate was then photolithographically micropatterned through a photomask by ultraviolet (UV) irradiation. The VLA-covered regions recognized specifically the lactose-binding lectin in PBS solution. On the other hand, the UV-irradiated regions, i.e., SiOx surface, prevented the nonspecific adsorption of the lectin from the contacting PBS solution. Several control experiments have demonstrated that the resistant-ability of SiOx surface as the matrix was comparable to the best of known system for resisting the nonspecific adsorption.
AB - Efficient matrix that resists the nonspecific adsorption of proteins from the contacting phosphate buffer silane (PBS) solution has been explored to fabricate carbohydrate arrays on silicon wafer. p-Vinylbenzyllactonoamide (VLA) was immobilized onto silicon through Si-C bond. The VLA-covered substrate was then photolithographically micropatterned through a photomask by ultraviolet (UV) irradiation. The VLA-covered regions recognized specifically the lactose-binding lectin in PBS solution. On the other hand, the UV-irradiated regions, i.e., SiOx surface, prevented the nonspecific adsorption of the lectin from the contacting PBS solution. Several control experiments have demonstrated that the resistant-ability of SiOx surface as the matrix was comparable to the best of known system for resisting the nonspecific adsorption.
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U2 - 10.1016/j.tsf.2005.07.048
DO - 10.1016/j.tsf.2005.07.048
M3 - Conference article
AN - SCOPUS:31544453064
SN - 0040-6090
VL - 499
SP - 213
EP - 218
JO - Thin Solid Films
JF - Thin Solid Films
IS - 1-2
T2 - Proceedings of the Sixth International Conference on Nano-Molecular Electronics (ICNME 2004)
Y2 - 15 December 2004 through 17 December 2004
ER -