Naho Itagaki

Scopus著者プロファイル

ウェブサイトhttps://hyoka.ofc.kyushu-u.ac.jp/search/details/K003622/index.html

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年別の研究成果

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フィンガープリント

Naho Itagakiが活動している研究トピックを掘り下げます。このトピックラベルは、この研究者の研究成果に基づきます。これらがまとまってユニークなフィンガープリントを構成します。

1 類似のプロファイル

123 学術誌
31 会議への寄与
15 会議記事
1 総説

Control of inhomogeneity and magnetic properties of ZnO:Co films grown by magnetron sputtering using nitrogen
Agusutrisno, M. N., Narishige, R., Kamataki, K., Okumura, T., Itagaki, N., Koga, K., Shiratani, M. & Yamashita, N., 8月 1 2023, In: Materials Science in Semiconductor Processing. 162, 107503.
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
Effects of substrate surface polarity on heteroepitaxial growth of pseudobinary ZnO–InN alloy films on ZnO substrates
Narishige, R., Yamashita, N., Kamataki, K., Okumura, T., Koga, K., Shiratani, M., Yabuta, H. & Itagaki, N., 4月 14 2023, In: Journal of Materials Research. 38, 7, p. 1803-1812 10 p.
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
1 被引用数 (Scopus)
Health assessment of rice cultivated and harvested from plasma-irradiated seeds
Okumura, T., Tanaka, H., Nakao, T., Anan, T., Arita, R., Shiraki, M., Shiraki, K., Miyabe, T., Yamashita, D., Matsuo, K., Attri, P., Kamataki, K., Yamashita, N., Itagaki, N., Shiratani, M., Hosoda, S., Tanaka, A., Ishibashi, Y. & Koga, K., 12月 2023, In: Scientific reports. 13, 1, 17450.
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
Low-temperature fabrication of silicon nitride thin films from a SiH₄+N₂ gas mixture by controlling SiN_x nanoparticle growth in multi-hollow remote plasma chemical vapor deposition
Kamataki, K., Sasaki, Y., Nagao, I., Yamashita, D., Okumura, T., Yamashita, N., Itagaki, N., Koga, K. & Shiratani, M., 9月 2023, In: Materials Science in Semiconductor Processing. 164, 107613.
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
Prediction by a hybrid machine learning model for high-mobility amorphous In₂O₃: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method
Kamataki, K., Ohtomo, H., Itagaki, N., Lesly, C. F., Yamashita, D., Okumura, T., Yamashita, N., Koga, K. & Shiratani, M., 10月 28 2023, In: Journal of Applied Physics. 134, 16, 163301.
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読

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板垣奈穂

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過去5年の共同研究と上位研究分野

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Control of inhomogeneity and magnetic properties of ZnO:Co films grown by magnetron sputtering using nitrogen

Effects of substrate surface polarity on heteroepitaxial growth of pseudobinary ZnO–InN alloy films on ZnO substrates

Health assessment of rice cultivated and harvested from plasma-irradiated seeds

Low-temperature fabrication of silicon nitride thin films from a SiH₄+N₂ gas mixture by controlling SiN_x nanoparticle growth in multi-hollow remote plasma chemical vapor deposition

Prediction by a hybrid machine learning model for high-mobility amorphous In₂O₃: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method

板垣 奈穂

フィンガープリント

過去5年の共同研究と上位研究分野

研究成果

Control of inhomogeneity and magnetic properties of ZnO:Co films grown by magnetron sputtering using nitrogen

Effects of substrate surface polarity on heteroepitaxial growth of pseudobinary ZnO–InN alloy films on ZnO substrates

Health assessment of rice cultivated and harvested from plasma-irradiated seeds

Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition

Prediction by a hybrid machine learning model for high-mobility amorphous In2O3: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method

板垣奈穂

Low-temperature fabrication of silicon nitride thin films from a SiH₄+N₂ gas mixture by controlling SiN_x nanoparticle growth in multi-hollow remote plasma chemical vapor deposition

Prediction by a hybrid machine learning model for high-mobility amorphous In₂O₃: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method