X-ray imaging test for a single-stage MEMS X-ray optical system

Ikuyuki Mitsuishi; Yuichiro Ezoe; Kensuke Ishizu; Teppei Moriyama; Yoshitomo Maeda; Takayuki Hayashi; Takuro Sato; Makoto Mita; N. Y. Yamasaki; K. Mitsuda; Mitsuhiro Horade; Susumu Sugiyama; Raul E. Riveros; Taylor Boggs; Hitomi Yamaguchi; Yoshiaki Kanamori; Kohei Morishita; Kazuo Nakajima; Ryutaro Maeda

doi:10.1109/OMEMS.2010.5672138

X-ray imaging test for a single-stage MEMS X-ray optical system

Ikuyuki Mitsuishi, Yuichiro Ezoe, Kensuke Ishizu, Teppei Moriyama, Yoshitomo Maeda, Takayuki Hayashi, Takuro Sato, Makoto Mita, N. Y. Yamasaki, K. Mitsuda, Mitsuhiro Horade, Susumu Sugiyama, Raul E. Riveros, Taylor Boggs, Hitomi Yamaguchi, Yoshiaki Kanamori, Kohei Morishita, Kazuo Nakajima, Ryutaro Maeda

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al K_α 1.49 keV for the first time. The image quality estimated as a half power diameter was ∼20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 ìm scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.

Original language	English
Title of host publication	2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
Pages	151-152
Number of pages	2
DOIs	https://doi.org/10.1109/OMEMS.2010.5672138
Publication status	Published - 2010
Externally published	Yes
Event	2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010 - Sapporo, Japan Duration: Aug 9 2010 → Aug 12 2010

Publication series

Name	2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010

Other

Other	2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
Country/Territory	Japan
City	Sapporo
Period	8/9/10 → 8/12/10

All Science Journal Classification (ASJC) codes

Control and Systems Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/OMEMS.2010.5672138

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Mitsuishi, I., Ezoe, Y., Ishizu, K., Moriyama, T., Maeda, Y., Hayashi, T., Sato, T., Mita, M., Yamasaki, N. Y., Mitsuda, K., Horade, M., Sugiyama, S., Riveros, R. E., Boggs, T., Yamaguchi, H., Kanamori, Y., Morishita, K., Nakajima, K., & Maeda, R. (2010). X-ray imaging test for a single-stage MEMS X-ray optical system. In 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010 (pp. 151-152). Article 5672138 (2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010). https://doi.org/10.1109/OMEMS.2010.5672138

X-ray imaging test for a single-stage MEMS X-ray optical system. / Mitsuishi, Ikuyuki; Ezoe, Yuichiro; Ishizu, Kensuke et al.
2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010. 2010. p. 151-152 5672138 (2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Mitsuishi, I, Ezoe, Y, Ishizu, K, Moriyama, T, Maeda, Y, Hayashi, T, Sato, T, Mita, M, Yamasaki, NY, Mitsuda, K, Horade, M, Sugiyama, S, Riveros, RE, Boggs, T, Yamaguchi, H, Kanamori, Y, Morishita, K, Nakajima, K & Maeda, R 2010, X-ray imaging test for a single-stage MEMS X-ray optical system. in 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010., 5672138, 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010, pp. 151-152, 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010, Sapporo, Japan, 8/9/10. https://doi.org/10.1109/OMEMS.2010.5672138

Mitsuishi I, Ezoe Y, Ishizu K, Moriyama T, Maeda Y, Hayashi T et al. X-ray imaging test for a single-stage MEMS X-ray optical system. In 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010. 2010. p. 151-152. 5672138. (2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010). doi: 10.1109/OMEMS.2010.5672138

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abstract = "An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al Kα 1.49 keV for the first time. The image quality estimated as a half power diameter was ∼20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 {\`i}m scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.",

author = "Ikuyuki Mitsuishi and Yuichiro Ezoe and Kensuke Ishizu and Teppei Moriyama and Yoshitomo Maeda and Takayuki Hayashi and Takuro Sato and Makoto Mita and Yamasaki, {N. Y.} and K. Mitsuda and Mitsuhiro Horade and Susumu Sugiyama and Riveros, {Raul E.} and Taylor Boggs and Hitomi Yamaguchi and Yoshiaki Kanamori and Kohei Morishita and Kazuo Nakajima and Ryutaro Maeda",

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doi = "10.1109/OMEMS.2010.5672138",

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booktitle = "2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010",

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AU - Mitsuishi, Ikuyuki

AU - Ezoe, Yuichiro

AU - Ishizu, Kensuke

AU - Moriyama, Teppei

AU - Maeda, Yoshitomo

AU - Hayashi, Takayuki

AU - Sato, Takuro

AU - Mita, Makoto

AU - Yamasaki, N. Y.

AU - Mitsuda, K.

AU - Horade, Mitsuhiro

AU - Sugiyama, Susumu

AU - Riveros, Raul E.

AU - Boggs, Taylor

AU - Yamaguchi, Hitomi

AU - Kanamori, Yoshiaki

AU - Morishita, Kohei

AU - Nakajima, Kazuo

AU - Maeda, Ryutaro

PY - 2010

Y1 - 2010

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AB - An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al Kα 1.49 keV for the first time. The image quality estimated as a half power diameter was ∼20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 ìm scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.

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T2 - 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010

Y2 - 9 August 2010 through 12 August 2010

ER -

X-ray imaging test for a single-stage MEMS X-ray optical system

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