Weakly copper-fullerenol layer on chemical mechanical polishing using water soluble fullerenol

Hirotaka Kishida; Yasuhiro Takaya; Terutake Hayashi; Masaki Michihata; Ken Kokubo

Weakly copper-fullerenol layer on chemical mechanical polishing using water soluble fullerenol

Hirotaka Kishida, Yasuhiro Takaya, Terutake Hayashi, Masaki Michihata, Ken Kokubo

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Proceedings - ASPE 2010 Annual Meeting
Pages	293-296
Number of pages	4
Publication status	Published - 2010
Externally published	Yes
Event	25th Annual Meeting of the American Society for Precision Engineering, ASPE 2010 - Atlanta, GA, United States Duration: Oct 31 2010 → Nov 4 2010

Publication series

Name	Proceedings - ASPE 2010 Annual Meeting
Volume	50

Other

Other	25th Annual Meeting of the American Society for Precision Engineering, ASPE 2010
Country/Territory	United States
City	Atlanta, GA
Period	10/31/10 → 11/4/10

All Science Journal Classification (ASJC) codes

Engineering (miscellaneous)

Cite this

Kishida, H, Takaya, Y, Hayashi, T, Michihata, M & Kokubo, K 2010, Weakly copper-fullerenol layer on chemical mechanical polishing using water soluble fullerenol. in Proceedings - ASPE 2010 Annual Meeting. Proceedings - ASPE 2010 Annual Meeting, vol. 50, pp. 293-296, 25th Annual Meeting of the American Society for Precision Engineering, ASPE 2010, Atlanta, GA, United States, 10/31/10.

@inproceedings{4f9d3d35487e422c89b3b7a49eff273c,

title = "Weakly copper-fullerenol layer on chemical mechanical polishing using water soluble fullerenol",

author = "Hirotaka Kishida and Yasuhiro Takaya and Terutake Hayashi and Masaki Michihata and Ken Kokubo",

year = "2010",

language = "English",

isbn = "9781887706568",

series = "Proceedings - ASPE 2010 Annual Meeting",

pages = "293--296",

booktitle = "Proceedings - ASPE 2010 Annual Meeting",

note = "25th Annual Meeting of the American Society for Precision Engineering, ASPE 2010 ; Conference date: 31-10-2010 Through 04-11-2010",

}

TY - GEN

T1 - Weakly copper-fullerenol layer on chemical mechanical polishing using water soluble fullerenol

AU - Kishida, Hirotaka

AU - Takaya, Yasuhiro

AU - Hayashi, Terutake

AU - Michihata, Masaki

AU - Kokubo, Ken

PY - 2010

Y1 - 2010

UR - http://www.scopus.com/inward/record.url?scp=84884409562&partnerID=8YFLogxK

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M3 - Conference contribution

AN - SCOPUS:84884409562

SN - 9781887706568

T3 - Proceedings - ASPE 2010 Annual Meeting

SP - 293

EP - 296

BT - Proceedings - ASPE 2010 Annual Meeting

T2 - 25th Annual Meeting of the American Society for Precision Engineering, ASPE 2010

Y2 - 31 October 2010 through 4 November 2010

ER -

Weakly copper-fullerenol layer on chemical mechanical polishing using water soluble fullerenol

Publication series

Other

All Science Journal Classification (ASJC) codes

Other files and links

Cite this