Water ultrarepellency induced by nanocolumnar ZnO surface

Xin Tong Zhang; Osamu Sato; Akira Fujishima

doi:10.1021/la049471f

Water ultrarepellency induced by nanocolumnar ZnO surface

Xin Tong Zhang, Osamu Sato, Akira Fujishima

Research output: Contribution to journal › Article › peer-review

116 Citations (Scopus)

Abstract

A surface microtexture comprised of ZnO nanocolumns prepared by a facial cathodic electrode deposition was analyzed. The surface microtexture shows both advancing and receding contact angles (CA) of water higher than 150° after being modified with a monolayer of fluoroalkylsilane (FAS). The columnar surface showed such a small water CA hysteresis that water droplet could not adhered on the surface even placed horizontally. The results show that the ultrahydrophobic ZnO surface can be patterned by UV light, which was more important for a variety of applications such as microchips, microfluidic devices and biotechnology.

Original language	English
Pages (from-to)	6065-6067
Number of pages	3
Journal	Langmuir
Volume	20
Issue number	14
DOIs	https://doi.org/10.1021/la049471f
Publication status	Published - Jul 6 2004
Externally published	Yes

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Surfaces and Interfaces
Spectroscopy
Electrochemistry

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10.1021/la049471f

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abstract = "A surface microtexture comprised of ZnO nanocolumns prepared by a facial cathodic electrode deposition was analyzed. The surface microtexture shows both advancing and receding contact angles (CA) of water higher than 150° after being modified with a monolayer of fluoroalkylsilane (FAS). The columnar surface showed such a small water CA hysteresis that water droplet could not adhered on the surface even placed horizontally. The results show that the ultrahydrophobic ZnO surface can be patterned by UV light, which was more important for a variety of applications such as microchips, microfluidic devices and biotechnology.",

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AU - Sato, Osamu

AU - Fujishima, Akira

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N2 - A surface microtexture comprised of ZnO nanocolumns prepared by a facial cathodic electrode deposition was analyzed. The surface microtexture shows both advancing and receding contact angles (CA) of water higher than 150° after being modified with a monolayer of fluoroalkylsilane (FAS). The columnar surface showed such a small water CA hysteresis that water droplet could not adhered on the surface even placed horizontally. The results show that the ultrahydrophobic ZnO surface can be patterned by UV light, which was more important for a variety of applications such as microchips, microfluidic devices and biotechnology.

AB - A surface microtexture comprised of ZnO nanocolumns prepared by a facial cathodic electrode deposition was analyzed. The surface microtexture shows both advancing and receding contact angles (CA) of water higher than 150° after being modified with a monolayer of fluoroalkylsilane (FAS). The columnar surface showed such a small water CA hysteresis that water droplet could not adhered on the surface even placed horizontally. The results show that the ultrahydrophobic ZnO surface can be patterned by UV light, which was more important for a variety of applications such as microchips, microfluidic devices and biotechnology.

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Water ultrarepellency induced by nanocolumnar ZnO surface

Abstract

All Science Journal Classification (ASJC) codes

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