TY - JOUR
T1 - Vertical edge graphite layer on recovered diamond (001) after high-dose ion implantation and high-temperature annealing
AU - Inaba, Masafumi
AU - Seki, Akinori
AU - Sato, Kazuaki
AU - Kushida, Tomoyoshi
AU - Kageura, Taisuke
AU - Yamano, Hayate
AU - Hiraiwa, Atsushi
AU - Kawarada, Hiroshi
N1 - Funding Information:
This study was supported by the Japan Society for the Promotion of Science by a Grant-in-Aid for Fundamental Research S (26220903) and by the Kato Foundation for the Promotion of Science (KS-2831). We thank Dr. Nagamachi at the Ion Technology Center Co., Ltd. (Nagamachi Science Laboratory Co., Ltd.) for advice in the SRIM calculation of hot implantation in the SRIM calculation of hot implantation.
PY - 2017/9
Y1 - 2017/9
N2 - A vertical edge graphite layer (VEG) fabricated on a diamond (001) substrate and the recovery of the crystallinity of the diamond substrate following high-dose ion implantation and high-temperature annealing (HTA) was investigated. The Al ions were implanted into the diamond (001) surface at 773 K (500 °C), followed by HTA at 1973 K (1700 °C). The graphite edges were vertically oriented, but each domain was randomly rotated in the in-plane direction, which was confirmed via multiple cross-sectional transmission electron microscopy images obtained from different directions rotated 2, 5, 10, and 15° around the [001] axis. The Raman and photoluminescence exhibited no significant peaks. The initial sp2 structure state of the VEG was nucleated in an early stage of the HTA and the surface diamond was subsequently reconstructed, which was confirmed using stopping-and-range-of-ions-in-matter calculations and Rutherford backscattering/channeling (RBS-C) measurements. The RBS-C spectra indicate that the crystal is maintained after hot implantation and is recovered by HTA. This VEG structure may be useful for ohmic contact with diamond electrical devices.
AB - A vertical edge graphite layer (VEG) fabricated on a diamond (001) substrate and the recovery of the crystallinity of the diamond substrate following high-dose ion implantation and high-temperature annealing (HTA) was investigated. The Al ions were implanted into the diamond (001) surface at 773 K (500 °C), followed by HTA at 1973 K (1700 °C). The graphite edges were vertically oriented, but each domain was randomly rotated in the in-plane direction, which was confirmed via multiple cross-sectional transmission electron microscopy images obtained from different directions rotated 2, 5, 10, and 15° around the [001] axis. The Raman and photoluminescence exhibited no significant peaks. The initial sp2 structure state of the VEG was nucleated in an early stage of the HTA and the surface diamond was subsequently reconstructed, which was confirmed using stopping-and-range-of-ions-in-matter calculations and Rutherford backscattering/channeling (RBS-C) measurements. The RBS-C spectra indicate that the crystal is maintained after hot implantation and is recovered by HTA. This VEG structure may be useful for ohmic contact with diamond electrical devices.
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U2 - 10.1002/pssb.201700040
DO - 10.1002/pssb.201700040
M3 - Article
AN - SCOPUS:85019857794
SN - 0370-1972
VL - 254
JO - Physica Status Solidi (B) Basic Research
JF - Physica Status Solidi (B) Basic Research
IS - 9
M1 - 1700040
ER -