Vaporization and nucleation on microheater in microchannel with nozzle

Koji Takahashi; Hirofumi Sakai; Kunihito Nagayama; Akihito Baba; Kenji Makihira; Tanemasa Asano

doi:10.2514/6.2001-3075

Vaporization and nucleation on microheater in microchannel with nozzle

Koji Takahashi, Hirofumi Sakai, Kunihito Nagayama, Akihito Baba, Kenji Makihira, Tanemasa Asano

Research output: Contribution to conference › Paper › peer-review

2 Citations (Scopus)

Abstract

A vaporization microchamber is fabricated by the MEMS technology in order to improve and check the concept of vaporizing liquid microthruster for nanosatellite. This chamber is a part of microchannel with 2-10 micrometers height made by silicon and glass substrates. Nozzle is fabricated in silicon just above a thin film ITO heater deposited on glass. Liquid propellant is repetitively pulse-heated by the heater and the flow pattern is recorded thorough glass and ITO by high-speed video camera. Four types of flow patterns are found depending on the employed voltage, pulse width and frequency. For example, large heat flux per pulse of high frequency does not allow the liquid to fill the chamber. Even with lower heat flux, no droplet emission from the nozzle is observed because the nozzle itself is heated enough in this geometry. The nanoscale cavity or roughness on heating surface is found to play an important role for the nucleation in microchannel. The preferable thermal design for microthruster is also discussed.

Original language	English
DOIs	https://doi.org/10.2514/6.2001-3075
Publication status	Published - 2001
Event	35th AIAA Thermophysics Conference 2001 - Anaheim, CA, United States Duration: Jun 11 2001 → Jun 14 2001

Other

Other	35th AIAA Thermophysics Conference 2001
Country/Territory	United States
City	Anaheim, CA
Period	6/11/01 → 6/14/01

All Science Journal Classification (ASJC) codes

Aerospace Engineering
Mechanical Engineering
Condensed Matter Physics

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10.2514/6.2001-3075

Cite this

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title = "Vaporization and nucleation on microheater in microchannel with nozzle",

abstract = "A vaporization microchamber is fabricated by the MEMS technology in order to improve and check the concept of vaporizing liquid microthruster for nanosatellite. This chamber is a part of microchannel with 2-10 micrometers height made by silicon and glass substrates. Nozzle is fabricated in silicon just above a thin film ITO heater deposited on glass. Liquid propellant is repetitively pulse-heated by the heater and the flow pattern is recorded thorough glass and ITO by high-speed video camera. Four types of flow patterns are found depending on the employed voltage, pulse width and frequency. For example, large heat flux per pulse of high frequency does not allow the liquid to fill the chamber. Even with lower heat flux, no droplet emission from the nozzle is observed because the nozzle itself is heated enough in this geometry. The nanoscale cavity or roughness on heating surface is found to play an important role for the nucleation in microchannel. The preferable thermal design for microthruster is also discussed.",

author = "Koji Takahashi and Hirofumi Sakai and Kunihito Nagayama and Akihito Baba and Kenji Makihira and Tanemasa Asano",

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language = "English",

note = "35th AIAA Thermophysics Conference 2001 ; Conference date: 11-06-2001 Through 14-06-2001",

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T1 - Vaporization and nucleation on microheater in microchannel with nozzle

AU - Takahashi, Koji

AU - Sakai, Hirofumi

AU - Nagayama, Kunihito

AU - Baba, Akihito

AU - Makihira, Kenji

AU - Asano, Tanemasa

PY - 2001

Y1 - 2001

N2 - A vaporization microchamber is fabricated by the MEMS technology in order to improve and check the concept of vaporizing liquid microthruster for nanosatellite. This chamber is a part of microchannel with 2-10 micrometers height made by silicon and glass substrates. Nozzle is fabricated in silicon just above a thin film ITO heater deposited on glass. Liquid propellant is repetitively pulse-heated by the heater and the flow pattern is recorded thorough glass and ITO by high-speed video camera. Four types of flow patterns are found depending on the employed voltage, pulse width and frequency. For example, large heat flux per pulse of high frequency does not allow the liquid to fill the chamber. Even with lower heat flux, no droplet emission from the nozzle is observed because the nozzle itself is heated enough in this geometry. The nanoscale cavity or roughness on heating surface is found to play an important role for the nucleation in microchannel. The preferable thermal design for microthruster is also discussed.

AB - A vaporization microchamber is fabricated by the MEMS technology in order to improve and check the concept of vaporizing liquid microthruster for nanosatellite. This chamber is a part of microchannel with 2-10 micrometers height made by silicon and glass substrates. Nozzle is fabricated in silicon just above a thin film ITO heater deposited on glass. Liquid propellant is repetitively pulse-heated by the heater and the flow pattern is recorded thorough glass and ITO by high-speed video camera. Four types of flow patterns are found depending on the employed voltage, pulse width and frequency. For example, large heat flux per pulse of high frequency does not allow the liquid to fill the chamber. Even with lower heat flux, no droplet emission from the nozzle is observed because the nozzle itself is heated enough in this geometry. The nanoscale cavity or roughness on heating surface is found to play an important role for the nucleation in microchannel. The preferable thermal design for microthruster is also discussed.

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T2 - 35th AIAA Thermophysics Conference 2001

Y2 - 11 June 2001 through 14 June 2001

ER -

Vaporization and nucleation on microheater in microchannel with nozzle

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