TY - JOUR
T1 - van der Waals Contact Engineering of Graphene Field-Effect Transistors for Large-Area Flexible Electronics
AU - Liu, Fengyuan
AU - Navaraj, William Taube
AU - Yogeswaran, Nivasan
AU - Gregory, Duncan H.
AU - Dahiya, Ravinder
N1 - Funding Information:
This work was supported in part by the EPSRC Engineering Fellowship for Growth−PRINTSKIN (EP/M002527/1) and Neuromorphic Printed Tactile Skin (NeuPRINTSKIN EP/ R029644/1). F.L. would like to acknowledge the Lord Kelvin-Adam Smith Ph.D. Scholarship by the University of Glasgow. The authors are thankful to the support received for this work from James Watt Nanofabrication Centre (JWNC) and Electronics Systems Design Centre (ESDC), University of Glasgow.
Publisher Copyright:
© 2019 American Chemical Society.
PY - 2019/3/26
Y1 - 2019/3/26
N2 - Graphene has great potential for high-performance flexible electronics. Although studied for more than a decade, contacting graphene efficiently, especially for large-area, flexible electronics, is still a challenge. Here, by engineering the graphene-metal van der Waals (vdW) contact, we demonstrate that ultralow contact resistance is achievable via a bottom-contact strategy incorporating a simple transfer process without any harsh thermal treatment (>150 °C). The majority of the fabricated devices show contact resistances below 200 I μm with values as low as 65 I μm achievable. This is on par with the state-of-the-art top- A nd edge-contacted graphene field-effect transistors. Further, our study reveals that these contacts, despite the presumed weak nature of the vdW interaction, are stable under various bending conditions, thus guaranteeing compatibility with flexible electronics with improved performance. This work illustrates the potential of the previously underestimated vdW contact approach for large-area flexible electronics.
AB - Graphene has great potential for high-performance flexible electronics. Although studied for more than a decade, contacting graphene efficiently, especially for large-area, flexible electronics, is still a challenge. Here, by engineering the graphene-metal van der Waals (vdW) contact, we demonstrate that ultralow contact resistance is achievable via a bottom-contact strategy incorporating a simple transfer process without any harsh thermal treatment (>150 °C). The majority of the fabricated devices show contact resistances below 200 I μm with values as low as 65 I μm achievable. This is on par with the state-of-the-art top- A nd edge-contacted graphene field-effect transistors. Further, our study reveals that these contacts, despite the presumed weak nature of the vdW interaction, are stable under various bending conditions, thus guaranteeing compatibility with flexible electronics with improved performance. This work illustrates the potential of the previously underestimated vdW contact approach for large-area flexible electronics.
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U2 - 10.1021/acsnano.8b09019
DO - 10.1021/acsnano.8b09019
M3 - Article
C2 - 30835440
AN - SCOPUS:85062823812
SN - 1936-0851
VL - 13
SP - 3257
EP - 3268
JO - ACS nano
JF - ACS nano
IS - 3
ER -