TY - JOUR
T1 - Two-dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD
AU - Nakamura, William Makoto
AU - Miyahara, Hiroomi
AU - Sato, Hiroshi
AU - Matsuzaki, Hidefumi
AU - Koga, Kazunori
AU - Shiratani, Masaharu
N1 - Funding Information:
Manuscript received November 30, 2007; revised April 7, 2008. This work was supported in part by the New Energy and Industrial Technology Development Organization (NEDO). The authors are with the Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan (e-mail: w.nakamura@plasma.ed.kyushu-u.ac.jp; siratani@ed.kyushu-u.ac.jp). Color versions of one or more of the figures in this paper are available online at http://ieeexplore.ieee.org. Digital Object Identifier 10.1109/TPS.2008.923830
PY - 2008/8
Y1 - 2008/8
N2 - Using an optical-scanning method, we obtained 2-D spatial profile of deposition rate of hydrogenated amorphous silicon (a-Si:H) films deposited by a multihollow discharge plasma CVD with a high spatial resolution. From the profile, we deduced 2-D spatial profile of the volume fraction of nanoparticles incorporated into films, since nanoparticles affect optical and electronic properties of a-Si:H films.
AB - Using an optical-scanning method, we obtained 2-D spatial profile of deposition rate of hydrogenated amorphous silicon (a-Si:H) films deposited by a multihollow discharge plasma CVD with a high spatial resolution. From the profile, we deduced 2-D spatial profile of the volume fraction of nanoparticles incorporated into films, since nanoparticles affect optical and electronic properties of a-Si:H films.
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U2 - 10.1109/TPS.2008.923830
DO - 10.1109/TPS.2008.923830
M3 - Article
AN - SCOPUS:50249139217
SN - 0093-3813
VL - 36
SP - 888
EP - 889
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 4 PART 1
ER -