Using an optical-scanning method, we obtained 2-D spatial profile of deposition rate of hydrogenated amorphous silicon (a-Si:H) films deposited by a multihollow discharge plasma CVD with a high spatial resolution. From the profile, we deduced 2-D spatial profile of the volume fraction of nanoparticles incorporated into films, since nanoparticles affect optical and electronic properties of a-Si:H films.
All Science Journal Classification (ASJC) codes
- Nuclear and High Energy Physics
- Condensed Matter Physics