TY - JOUR
T1 - Transient three-dimensional numerical computation for unsteady oxygen concentration in a silicon melt during a Czochralski process under a cusp-shaped magnetic field
AU - Won, Yoo Cheol
AU - Kakimoto, Koichi
AU - Ozoe, Hiroyuki
N1 - Copyright:
Copyright 2007 Elsevier B.V., All rights reserved.
PY - 2001/12
Y1 - 2001/12
N2 - This paper presents numerical computation for the transient oxygen concentration of a silicon melt in a Czochralski process under a cusp-shaped magnetic field. Transient three-dimensional numerical calculations were carried out for two cases of Ha = 0 and 161 for Pr = 0.013, Ra = 3.92 × 105, Recr=1329, Recu = -1596 and Sc = 5.5. The SIMPLE algorithm was employed. The oxygen concentration at a fixed point has a periodic oscillation as a function of time. The local and average oxygen concentrations in the silicon melt were less with a cusp-shaped magnetic field than those without a magnetic field. The power spectral density for the oxygen concentration fluctuation was also computed.
AB - This paper presents numerical computation for the transient oxygen concentration of a silicon melt in a Czochralski process under a cusp-shaped magnetic field. Transient three-dimensional numerical calculations were carried out for two cases of Ha = 0 and 161 for Pr = 0.013, Ra = 3.92 × 105, Recr=1329, Recu = -1596 and Sc = 5.5. The SIMPLE algorithm was employed. The oxygen concentration at a fixed point has a periodic oscillation as a function of time. The local and average oxygen concentrations in the silicon melt were less with a cusp-shaped magnetic field than those without a magnetic field. The power spectral density for the oxygen concentration fluctuation was also computed.
UR - http://www.scopus.com/inward/record.url?scp=0035546501&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0035546501&partnerID=8YFLogxK
U2 - 10.1016/S0022-0248(01)01623-2
DO - 10.1016/S0022-0248(01)01623-2
M3 - Article
AN - SCOPUS:0035546501
SN - 0022-0248
VL - 233
SP - 622
EP - 630
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
IS - 4
ER -