TY - JOUR
T1 - Thermodynamical analysis of oxygen incorporation from a quartz crucible during solidification of multicrystalline silicon for solar cell
AU - Matsuo, Hitoshi
AU - Bairava Ganesh, R.
AU - Nakano, Satoshi
AU - Liu, Lijun
AU - Kangawa, Yoshihiro
AU - Arafune, Koji
AU - Ohshita, Yoshio
AU - Yamaguchi, Masafumi
AU - Kakimoto, Koichi
PY - 2008/11/1
Y1 - 2008/11/1
N2 - We proposed an oxygen transport model in which the reaction between a liner made of Si3N4 and a crucible made of SiO2 was taken into account to study the mechanism of oxygen incorporation in multicrystalline silicon for a solar cell grown by the unidirectional solidification method. The equilibrium oxygen concentration in the case of the unidirectional solidification method was calculated by taking into account the two interfaces between a quartz crucible and a liner of Si3N4 and between a liner of Si3N4 and silicon melt. The calculated equilibrium oxygen concentration was less than half of that in the case of the Czochralski method, in which oxygen was directly dissolved from a quartz crucible into the melt. We also calculated the distribution of oxygen concentration in a silicon crystal by using numerical calculation with global modeling. The equilibrium concentrations of oxygen in the two cases were used as boundary conditions at the interface between silicon melt and quartz crucible in the numerical calculation. The results of numerical calculation by taking into account the Si3N4 coating were found to be close to the experimental results. From these results, we concluded that oxygen was incorporated from a quartz crucible into the melt through the coating material of Si3N4 during the growth process.
AB - We proposed an oxygen transport model in which the reaction between a liner made of Si3N4 and a crucible made of SiO2 was taken into account to study the mechanism of oxygen incorporation in multicrystalline silicon for a solar cell grown by the unidirectional solidification method. The equilibrium oxygen concentration in the case of the unidirectional solidification method was calculated by taking into account the two interfaces between a quartz crucible and a liner of Si3N4 and between a liner of Si3N4 and silicon melt. The calculated equilibrium oxygen concentration was less than half of that in the case of the Czochralski method, in which oxygen was directly dissolved from a quartz crucible into the melt. We also calculated the distribution of oxygen concentration in a silicon crystal by using numerical calculation with global modeling. The equilibrium concentrations of oxygen in the two cases were used as boundary conditions at the interface between silicon melt and quartz crucible in the numerical calculation. The results of numerical calculation by taking into account the Si3N4 coating were found to be close to the experimental results. From these results, we concluded that oxygen was incorporated from a quartz crucible into the melt through the coating material of Si3N4 during the growth process.
UR - http://www.scopus.com/inward/record.url?scp=55549097421&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=55549097421&partnerID=8YFLogxK
U2 - 10.1016/j.jcrysgro.2008.08.045
DO - 10.1016/j.jcrysgro.2008.08.045
M3 - Article
AN - SCOPUS:55549097421
SN - 0022-0248
VL - 310
SP - 4666
EP - 4671
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
IS - 22
ER -