The characteristics of multilayer thin films deposited with metal thin films (Ag, Al, Cu)

Dong Hun Kim, Ri Ichi Murakami, Yun Hae Kim, Kyung Man Moon, Seung Jun An, Tae Hyun Kim, Pang Pang Wang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

In order to study the characteristics of multilayer thin films with a ZnO/ metal/ ZnO structure the manufacture of the thin films was performed by a dc (direct current) magnetron sputtering system on slide glass substrates. The ZnO thin films were manufactured with the thicknesses of 30 nm and 50 nm. Three kinds of metals (Ag, Al and Cu) were deposited with the thicknesses of 4 nm, 8 nm, 12 nm and 16 nm. The electrical and optical properties of the manufactured thin films were then observed. As a result, the multilayer thin films with an Ag layer represented the most excellent electrical conductivity. This is due to the difference in the fundamental electrical properties of each of the metals. The structures of the metal particles deposited on the ZnO thin films were observed by an SEM (scanning electron microscope). The thin films exhibited a continuous structure with regular spaces between the metal particles. This resulted in an increase of transmittance. This is considered by the decrease of scattering and of light absorption on thin films with a continuous structure.

Original languageEnglish
Title of host publicationManufacturing Science and Engineering I
Pages1768-1771
Number of pages4
DOIs
Publication statusPublished - 2010
Externally publishedYes
Event2009 International Conference on Manufacturing Science and Engineering, ICMSE 2009 - Zhuhai, China
Duration: Dec 26 2009Dec 28 2009

Publication series

NameAdvanced Materials Research
Volume97-101
ISSN (Print)1022-6680

Other

Other2009 International Conference on Manufacturing Science and Engineering, ICMSE 2009
Country/TerritoryChina
CityZhuhai
Period12/26/0912/28/09

All Science Journal Classification (ASJC) codes

  • General Engineering

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