TY - JOUR
T1 - Tailoring Nucleation at Two Interfaces Enables Single Crystalline NiO Nanowires via Vapor-Liquid-Solid Route
AU - Nagashima, Kazuki
AU - Yoshida, Hideto
AU - Klamchuen, Annop
AU - Kanai, Masaki
AU - Meng, Gang
AU - Zhuge, Fuwei
AU - He, Yong
AU - Anzai, Hiroshi
AU - Zhu, Zetao
AU - Suzuki, Masaru
AU - Boudot, Mickaël
AU - Takeda, Seiji
AU - Yanagida, Takeshi
N1 - Publisher Copyright:
© 2016 American Chemical Society.
PY - 2016/10/19
Y1 - 2016/10/19
N2 - Here we show a rational strategy to fabricate single crystalline NiO nanowires via a vapor-liquid-solid (VLS) route, which essentially allows us to tailor the diameter and the spatial position. Our strategy is based on the suppression of the nucleation at vapor-solid (VS) interface, which promotes nucleation only at the liquid-solid (LS) interface. Manipulating both the supplied material fluxes (oxygen and metal) and the growth temperature enables enhancement of the nucleation only at the LS interface. Furthermore, this strategy allows us to reduce the growth temperature of single crystalline NiO nanowires down to 550 °C, which is the lowest growth temperature so far reported.
AB - Here we show a rational strategy to fabricate single crystalline NiO nanowires via a vapor-liquid-solid (VLS) route, which essentially allows us to tailor the diameter and the spatial position. Our strategy is based on the suppression of the nucleation at vapor-solid (VS) interface, which promotes nucleation only at the liquid-solid (LS) interface. Manipulating both the supplied material fluxes (oxygen and metal) and the growth temperature enables enhancement of the nucleation only at the LS interface. Furthermore, this strategy allows us to reduce the growth temperature of single crystalline NiO nanowires down to 550 °C, which is the lowest growth temperature so far reported.
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U2 - 10.1021/acsami.6b09761
DO - 10.1021/acsami.6b09761
M3 - Article
AN - SCOPUS:84992200208
SN - 1944-8244
VL - 8
SP - 27892
EP - 27899
JO - ACS Applied Materials and Interfaces
JF - ACS Applied Materials and Interfaces
IS - 41
ER -