TY - JOUR
T1 - Suppression of by-product generation in the treatment of aromatic perfumery substances using a surface discharge
AU - Hayashi, Nobuya
AU - Sougumo, Shohei
N1 - Funding Information:
Part of this work was supported by a Grant-in-Aid for Young Scientists (B) from the Ministry of Education, Culture, Sports, Science and Technology.
PY - 2008/9/4
Y1 - 2008/9/4
N2 - Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8% using the discharge with UV light is 96%, that is 12% higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.
AB - Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8% using the discharge with UV light is 96%, that is 12% higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.
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U2 - 10.1016/j.vacuum.2008.03.058
DO - 10.1016/j.vacuum.2008.03.058
M3 - Article
AN - SCOPUS:49949090899
SN - 0042-207X
VL - 83
SP - 138
EP - 141
JO - Vacuum
JF - Vacuum
IS - 1
ER -
