TY - JOUR
T1 - Super-smooth processing of CVD-SiC using combined electrolytic in-process dressing grinding and fixed softer-than-diamond abrasive grinding
AU - Ao, Xuemei
AU - Kurokawa, Syuhei
AU - Hayashi, Terutake
AU - Ohmori, Hitoshi
AU - Jia, Chen
N1 - Publisher Copyright:
© The Author(s), under exclusive licence to Springer-Verlag London Ltd., part of Springer Nature 2025.
PY - 2025/7
Y1 - 2025/7
N2 - Chemical vapor-deposited silicon carbide (CVD-SiC) is ideal for optical applications owing to its superior strength, thermal stability, and optical performance. However, chemical mechanical polishing (CMP) generates numerous surface steps, which hampers the application of CVD-SiC. This study proposes an innovative machining technology that combines an electrolytic in-process dressing grinding (preprocessing) and a fixed softer-than-diamond abrasive (FSTDA) grinding (finishing) process to achieve a super-smooth CVD-SiC surface while avoiding step formation. To this end, first, the characteristics of CVD-SiC substrates, including their surface morphology, composition, and crystal orientation, were analyzed. Subsequently, the finishing performances of three FSTDA grinding wheels (poly-CeO2, conventional alumina, and poly-SiC) were evaluated using confocal laser scanning microscopy, with a focus on their effects on surface morphology and roughness. The results confirmed the effectiveness of fixed abrasive grinding in suppressing step formation during CVD-SiC finishing. Additionally, scanning electron microscopy was employed to investigate the wear characteristics of the abrasive grains before and after usage. The results reveal a strong correlation between abrasive hardness and surface quality. For comparison, CMP was applied to CVD-SiC under same preprocessing conditions, thereby confirming the superior step suppression and surface planarization of FSTDA grinding. Experimental results indicate that finishing with a conventional alumina grinding wheel achieved a flat, scratch-free surface, therefore outperforming CMP in both step suppression and surface planarization. Thus, this study establishes an efficient and reliable technological approach for achieving super-smooth CVD-SiC surfaces, thereby laying a foundation for their broader application in high-precision optical systems.
AB - Chemical vapor-deposited silicon carbide (CVD-SiC) is ideal for optical applications owing to its superior strength, thermal stability, and optical performance. However, chemical mechanical polishing (CMP) generates numerous surface steps, which hampers the application of CVD-SiC. This study proposes an innovative machining technology that combines an electrolytic in-process dressing grinding (preprocessing) and a fixed softer-than-diamond abrasive (FSTDA) grinding (finishing) process to achieve a super-smooth CVD-SiC surface while avoiding step formation. To this end, first, the characteristics of CVD-SiC substrates, including their surface morphology, composition, and crystal orientation, were analyzed. Subsequently, the finishing performances of three FSTDA grinding wheels (poly-CeO2, conventional alumina, and poly-SiC) were evaluated using confocal laser scanning microscopy, with a focus on their effects on surface morphology and roughness. The results confirmed the effectiveness of fixed abrasive grinding in suppressing step formation during CVD-SiC finishing. Additionally, scanning electron microscopy was employed to investigate the wear characteristics of the abrasive grains before and after usage. The results reveal a strong correlation between abrasive hardness and surface quality. For comparison, CMP was applied to CVD-SiC under same preprocessing conditions, thereby confirming the superior step suppression and surface planarization of FSTDA grinding. Experimental results indicate that finishing with a conventional alumina grinding wheel achieved a flat, scratch-free surface, therefore outperforming CMP in both step suppression and surface planarization. Thus, this study establishes an efficient and reliable technological approach for achieving super-smooth CVD-SiC surfaces, thereby laying a foundation for their broader application in high-precision optical systems.
KW - CVD-SiC
KW - Chemical mechanical polishing
KW - Fixed abrasive grinding
KW - Step generation
KW - Surface planarization
UR - https://www.scopus.com/pages/publications/105010594577
UR - https://www.scopus.com/pages/publications/105010594577#tab=citedBy
U2 - 10.1007/s00170-025-16041-5
DO - 10.1007/s00170-025-16041-5
M3 - Article
AN - SCOPUS:105010594577
SN - 0268-3768
VL - 139
SP - 2803
EP - 2821
JO - International Journal of Advanced Manufacturing Technology
JF - International Journal of Advanced Manufacturing Technology
IS - 5-6
ER -