Sub-nm EOT ferroelectric HfO2 on p+Ge with highly reliable field cycling properties

X. Tian, L. Xu, S. Shibayama, T. Nishimura, T. Yajima, S. Migita, A. Toriumi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

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