TY - JOUR
T1 - Study of spatial profiles of capacitively coupled VHF H2 plasma by simulation
AU - Chen, Kuan Chen
AU - Chiu, Kuo Feng
AU - Ogiwara, Kohei
AU - Su, Li Wen
AU - Uchino, Kiichiro
AU - Kawai, Yoshinobu
PY - 2017/1
Y1 - 2017/1
N2 - The spatial profiles of a VHF H2 plasma (60MHz) for different discharge gap distances were examined at pressures of 66.7 and 133.3 Pa by twodimensional simulations using the plasma hybrid code. The electron density had a peak profile, and the maximum density depended on both the discharge gap distance and the pressure. A high-electron-density plasma with a low-electron temperature of approximately 1 eV was predicted by simulation at discharge gap distances of 15 and 20 mm. The plasma potential profile was composed of a plateau at the center and sharp slopes at the two sides. The axial profiles of the H+, H2+, and H3+ densities were calculated for the discharge gap distances of 10, 15, and 20 mm. It was found that the dominant ion species was H3+ except near the discharge electrode and the H2+ density near the discharge electrode was not negligible compared with the H3+ density at 66.7 Pa.
AB - The spatial profiles of a VHF H2 plasma (60MHz) for different discharge gap distances were examined at pressures of 66.7 and 133.3 Pa by twodimensional simulations using the plasma hybrid code. The electron density had a peak profile, and the maximum density depended on both the discharge gap distance and the pressure. A high-electron-density plasma with a low-electron temperature of approximately 1 eV was predicted by simulation at discharge gap distances of 15 and 20 mm. The plasma potential profile was composed of a plateau at the center and sharp slopes at the two sides. The axial profiles of the H+, H2+, and H3+ densities were calculated for the discharge gap distances of 10, 15, and 20 mm. It was found that the dominant ion species was H3+ except near the discharge electrode and the H2+ density near the discharge electrode was not negligible compared with the H3+ density at 66.7 Pa.
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U2 - 10.7567/JJAP.56.01AC05
DO - 10.7567/JJAP.56.01AC05
M3 - Article
AN - SCOPUS:85009110731
SN - 0021-4922
VL - 56
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 1
M1 - 01AC05
ER -