Study of Depth Distribution Shift of Copper on Silicon Wafer Surface Using Total Reflection X-Ray Fluorescence Spectrometry

Yoshihiro Mori, Kengo Shimanoe

Research output: Contribution to journalComment/debatepeer-review

7 Citations (Scopus)
Original languageEnglish
Pages (from-to)277-279
Number of pages3
Journalanalytical sciences
Issue number2
Publication statusPublished - Apr 1996
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Analytical Chemistry

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