Structural and compositional characterization of N 2 -H 2 plasma surface-treated TiO 2 thin films

L. Miao, S. Tanemura, H. Watanabe, S. Toh, K. Kaneko

    Research output: Contribution to journalConference articlepeer-review

    13 Citations (Scopus)


    The structural and compositional properties of three samples such as as-deposited single-phase anatase-TiO 2 polycrystalline thin films on slide glass substrates (No. 1), the sample surface-treated by N 2 -H 2 mixed-gases plasma (No. 2), and the sample being additionally anneal-treated in N 2 gases (No. 3), are characterized by transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS). The primitive lattice cells of three thin films are verified as distorted in comparison with that of bulk from the TEM results. This distortion of primitive lattice cell causes the increase of optical band gap for the films when we compared it with that of bulk, while the decrease of optical band gap should be attributed to the substitution of N into TiO 2 . Higher concentration of nitrogen in sample No. 3 is confirmed by line-EDS profiles under scanning TEM (STEM) when compared with sample No. 2 and this confirms that plasma surface treatment is an effective way for N-doping in TiO 2 .

    Original languageEnglish
    Pages (from-to)412-417
    Number of pages6
    JournalApplied Surface Science
    Issue number1-4
    Publication statusPublished - May 15 2005
    Event12th International Conference on Solid Films and Surfaces - Hammatsu, Japan
    Duration: Jun 21 2004Jun 25 2004

    All Science Journal Classification (ASJC) codes

    • General Chemistry
    • Condensed Matter Physics
    • General Physics and Astronomy
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films


    Dive into the research topics of 'Structural and compositional characterization of N 2 -H 2 plasma surface-treated TiO 2 thin films'. Together they form a unique fingerprint.

    Cite this